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Patent Granted on New Erbium-Doped Fiber

A patent has recently been granted to Fitel USA Corp., a parent company of OFS, for an erbium-doped fiber that is optimized for high-power
wavelength-division multiplexing (WDM) applications.

Erbium-doped fiber amplifiers are widely used in long-haul telecom and CATV applications. But these fibers have not been suitable for high-power amplifiers because they lack the required relatively flat gain spectrum and a low refractive index and thus a low numerical aperture (NA). Until now, it was possible to achieve a low NA, but the gain spectrum was not sufficiently flat. A fiber core doped with high concentrations of aluminum produces a flat gain spectrum, but aluminum also increases the NA.

OFS scientists have resolved this conflict by developing a fiber with an erbium-and germanium-doped core that is also doped with aluminum and fluorine. The aluminum helps achieve a relatively flat gain spectrum while the presence of fluorine lowers the refractive index – and thus the NA – even in the presence of aluminum.

This new fiber, HP980X, is a significant addition to the OFS family of erbium-doped fibers. In high-power WDM applications they make possible high power conversion while reducing both nonlinear effects, such as four-wave mixing, and excited state absorption.

Erbium-Doped Evolution
Erbium-Doped Fiber Evolution

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Tradeshow Update

 


Fiber News

OFS Explores New Applications for Higher-Order Mode Fiber Laser Technology
AVON, Conn. (June 18, 2007) – OFS Specialty Photonics is inviting collaborators to develop new applications that are based on two breakthroughs from its laboratories in higher-order mode (HOM) technology. OFS Laboratories has pioneered development of dispersion control technologies leading to ultra-fast pulse generation. The other is ultra-large mode area fibers.
Higher-Order Mode Fiber Laser >>

Global Trade

FINAL Rule
On Tuesday, June 19th, The Bureau of Industry & Security published their long awaited, highly publicized, FINAL rule, in the Code of Federal Register pertaining to the new dual-use export controls of high technology goods, services & Technology to China. This final rule follows a long year of public and industry comment on a proposed rule published in June 2006. To learn more about this final rule, visit
www.bis.doc.gov >>

 

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